Deep Moisturizing Mask C-275

High moisturizing and nourishing
Excellent hair care properties
Rinse-off product

Applications

Moisturizing

DANOX HC-30

Behenamidopropyl Dimethylamine, Dipalmitoylethyl Hydroxyethylmonium Methosulfate, Cetyl Alcohol

Behenamidopropyl Dimethylamine, Dipalmitoylethyl Hydroxyethylmonium Methosulfate, Cetyl Alcohol, Stearyl Alcohol, Lactic Acid.

Hair Conditioning agents

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